Committees

 

MNE International Steering Committee


Anja Boisen

          Technical University of Denmark, DK
Zahid Durrani
         Imperial College London , UK
Massimo Gentili
          PGT Photonics S.p.A., IT
Kenji Gamo
          Kansai Advanced Research Center, JP
Evangelos Gogolides
          NCSR Demokritos Athens, GR
Dieter Kern (chair)
          University of Tübingen, DE
Hans Loeschner
          IMS Nanofabrication Vienna, AT
Francesc Pérez-Murano
          CNM-CSIC Barcelona, ES
John N. Randall
          Zyvex Dallas, US
Kurt Ronse
          IMEC Leuven, BE
Michel Despont
          IBM Research, Zurich, CH
Emile van der Drift
          Delft University of Technology, NL
Christophe Vieu
          LAAS – CNRS Toulouse, FR

 

MNE 2009 Organising Committee

 

Kurt Ronse
          IMEC Leuven, BE

Conference Chair

Dries Van Thourhout
          IMEC/Intec Ghent, BE

Conference Co-chair

Stefan De Gendt
          IMEC Leuven, BE

Programme Chairs

Liesbet Lagae
          IMEC Leuven, BE

 

Geert Vandenberghe
          IMEC Leuven, BE

 

Ann Witvrouw
          IMEC Leuven, BE

 

Ariane Distelmans

IMEC Meeting Planner

Momentum

Professional Conference Organiser

 

 

MNE International Programme Committee


Gabriel Abadal Berini – Universitat Autònoma de Barcelona (UAB), Spain 
Maan M. Alkaisi – University of Canterbury, New Zealand 
Panagiotis Argitis – NCSR Demokritos, Greece 
Goncal Badenes – ICFO, Spain 
John E.E.E. Baglin – IBM Almaden Research Center, USA 
Joan Bausells – Centro Nacional de Microelectronica, Spain 
Uwe Behringer – UBC Microelectronics, Germany 
Konstantinos Beltsios – University of Ioannina, Greece 
Gérard BenAssayag – CEMES/CNRS, France
Isabelle Berbezier – IM2NP – CNRS, France
Rüdiger Berger – Max-Planck-Institute for Polymer Research, Germany 
Stefan Blunier – ETH Zuerich, Institute of Mechanical Systems, Switzerland 
Alexei Bogdanov – National Research Council Canada, Canada 
Anja B. Boisen – Technical University of Denmark, Denmark 
Caroline Bonafos – CEMES CNRS, France
Sywert Brongersma – IMEC Nl, The Netherlands
Stefano Cabrini – Lawrence Berkeley National Laboratory, USA
Christophe Cardinaud – CNRS-IMN, France 
Manish Chandhok – Intel Corporation, USA
Wen–Huei Chang – Chung Shan Medical University, Taiwan
Margarita Chatzichristidi – University of Athens, Greece
Lei Chen – National Institute of Standards and Technology, USA
Yong Chen – Ecole Normale Superieure, France
Hsuen Li Chen – National Taiwan University, Taiwan 
Rebecca Cheung – University of Edinburgh, UK 
Nikos Chronis – University of Michigan, USA
John Cleaver – University of Cambridge, UK
Pascal Colpo – European Commission Joint Research Centre, Italy
Vasilios Constantoudis – NCSR Demokritos, Greece 
Mike Cooke – Oxford Instruments, UK
David R.S. Cumming – University of Glasgow, UK 
Panos Datskos – Oak Ridge National Lab, USA
Christian David – Paul Scherrer Institute, Switzerland 
Zachary Davis – Department of Micro and Nanotechnology, Denmark 
Stefan De Gendt – IMEC, Belgium
Christophe Detavernier – Ghent University, Belgium
Massimo De Vittorio – National Nanotech. Laboratory CNR-INFM-ISUFI, Italy 
Iwijn de Vlaminck – TU Delft, The Netherlands
Michel Despont – IBM Research Laboratory, Switzerland 
Panayiotis Dimitrakis – NCSR Demokritos, Greece 
Zoran Djuric – IHTM – Inst. Microelectr. Techn. & Single Cry., Serbia & Montenegro 
Elizabeth Dobisz – Hitachi San Jose Research Center, USA
Charalabos Doumanides – University of Cyprus, Cyprus
Milan Drzik – International Laser Center, Slovak Republic 
Jens Ducrée – Biomedical Diagnostics Institute, Ireland
Zahid Durrani – Imperial College London, UK
Demetre J. Economou – University of Houston, USA
Nicholas Economou – Carl Zeiss SMT, USA
Miko C. Elwenspoek – University of Twente, The Netherlands 
Andreas Erdmann – Fraunhofer Institute IISB, Germany
Ben Eynon – Molecular Imprints Incorporated, USA
Maria Farsari – IESL-FORTH, Greece 
Theodore H. Fedynyshyn – MIT Lincoln Laboratory, USA 
Placid Ferreira – University of Illinois, USA
Paolo Fiorini  – IMEC, Belgium
Paddy French – Delft University of Technology, The Netherlands 
Peter Galajda – Delft University of Technology, The Netherlands
Gregg Gallatin – Applied Math Solutions, USA
Massimo Gentili – PGT-Photonics S.p.A., Italy 
Annamaria Gerardino – IFN-CNR, Italy
Jacques Gierak – CNRS-LPN, France 
Martin A.M. Gijs – EPF Lausanne, Switzerland 
Nikolaos Glezos – NCSR Demokritos, Greece 
Mieke Goethals – IMEC, Belgium
Evangelos Gogolides – NCSR Demokritos, Greece 
Kenneth Gonsalves – University of North Carolina, USA
Markus Graf – Sensirion AG, Switzerland
Brian J. Grenon – Grenon Consulting, USA 
Cynthia Hanson – SPAWAR, USA
Lloyd. R. Harriott – University of Virginia, USA 
Harry Heinzelmann – CSEM SA, Switzerland 
Eric Hendrickx – IMEC, Belgium
Laura Heyderman – Paul Scherrer Institute, Switzerland 
Andrew Holmes – Imperial College London, UK
Peter Hudek – Vorarlberg University of Applied Science, Austria 
Adrian Ionescu – EPFL, Switzerland 
Toshiro Itani – Selete, Japan 
Hiroyuki Ito – Hitachi High-Technologies, Japan 
Rik Jonckheere – IMEC, Belgium
Olivier Joubert – CNRS-LTM, France 
Sotirios Kakabakos – NCSR Demokritos, Greece
Gregory Kaltsas – TEI Athens, Greece
Songphol Kanjanachuchai – Chulalongkorn University, Thailand 
Eleftherios Kapetanakis – Technological Educational Institute of Crete, Greece 
Vassilis Karanassios – University of Waterloo, Canada
Dieter P. Kern – University of Tübingen, Germany 
Ho–Seob Kim – Sun Moon University, Korea 
Fu–Hsiang Ko – National Chiao Tung University, Taiwan 
Ivan Kostic – Slovak Academy of Sciences, Slovak Republic 
Anders Kristensen – Technical University of Denmark, Denmark 
Pieter Kruit – Delft University of Technology, The Netherlands 
Liesbet Lagae – IMEC, Belgium
Alexander Latyshev – Inst of SC Physics Novosibirsk, Russia 
Laura Lechuga Gómez – Research Center on Nanoscience and Nanotechnology (CIN2), Spain 
Daniel Lee – Institute of Bioengineering and Nanotechnology, Singapore
Michael Lercel – IBM, USA
Chun–Hung Lin – National Cheng Kung University, Taiwan 
Kevin Lister – EPFL, Switzerland
Chengxun Liu – IMEC, Belgium
Hans Loeschner – IMS Nanofabrication, Austria 
Leandro Lorenzelli – FBK-Centre for Materials and Microsystems (CMM), Italy
Didier Louis – CEA-LETI-MINATEC, France 
Jack Luo – CMRI, University of Bolton, UK
Regina Luttge – University of Twente, The Netherlands 
Mireille Maenhoudt – IMEC, Belgium
Eleni Makarona – NCSR Demokritos, Greece
Laurent Malaquin – Institut Marie Curie, France
Martin McCallum – Nikon Precision Europe, UK
Mark McCord – KLA–Tencor, USA 
Santos Merino –  Fundación Tekniker, Spain 
Hiroshi Mizuta – University of Southampton, UK
Georgy Mladenov – Bulgarian Academy of Sciences, Bulgaria 
Faisal Mohd Yasin – Multimedia University, Malaysia  
Antonio Molfese – STMicroelectronics, Italy
Antonio Moreira – Instituto Superior Technico, Portugal
Kirsten Moselund – IBM Zürich, Switzerland
Isabella Moser – Jobst Technologies, Germany
Miha Mraz – University of Ljubljana, Slovenia 
Patrick Naulleau – Lawrence Berkeley National Laboratory, USA
Pascal Normand – NCSR Demokritos, Greece 
Leonidas Ocola – Argonne National Laboratory, USA
Heidi Ottevaere – Vrije Universiteit Brussel, Belgium
Stella W. Pang – University of Michigan, USA 
Athanasios Papathanasiou – NTUA, Greece
Georg Pawlowski – AZ Electronic Materials, USA
Francesc Pérez–Murano – CNM-IMB-CSIC, Spain 
Christophe Peroz – Beam Technologies, USA
Jacques Perrocheau – JEMI France, France 
Panayiota Petrou – NCSR Demokritos, Greece 
David Peyrade – LTM-CNRS c/o CEA-Minatec, France
Francesco Pieri – Universita di Pisa, Italy
Philip Prewett – University of Birmingham, UK
Christopher Progler – Photronics, USA
Bob Puers – KU Leuven, Belgium
John Randall – Zyvex Labs, USA
Ivo W. Rangelow – Technische Universität Ilmenau, Germany 
Ioannis Raptis – NCSR Demokritos, Greece 
Gareth Redmond – University College Dublin, Ireland
Johann Peter Reithmaier – University of Kassel, Germany 
Douglas J. Resnick – Molecular Imprint, USA 
Heike Riel – IBM Research GmbH, Switzerland 
Alex P.G. Robinson – University of Birmingham, UK 
Albert Romano–Rodríguez – IN2UB-University of Barcelona, Spain 
Kurt Ronse – IMEC, Belgium
Mordechai Rothschild – MIT Lincoln Laboratories, USA 
Cristina Rusu – Imego AB, Sweden
Veronica Savu – EPFL, Switzerland 
Hella C. Scheer – University of Wuppertal, Germany 
Patrick Schiavone – CNRS, USA
Denis Shamiriyan – IMEC, Belgium
Jiann Shieh – National Nano Device Laboratory, Taiwan
Henry I. Smith – Massachusetts Inst. of Technology, USA 
Elin Sondergard – Saint–Gobain, France
Clivia Sotomayor Torres – CIN2–ICN, Spain 
Regina Soufli – Lawrence Livermore National Laboratory, USA
Andris Šternberg – University of Latvia, Latvia 
Gottfried Strasser – Vienna University of Technology, Austria 
Michael Stuke – Max Planck Institute Göttingen, Germany 
Kazuaki Suzuki – Nikon Corporation, Japan 
Winnie Svendsen – DTU Nanotech-Technical University of Denmark, Denmark 
Serge Tedesco – CEA – LETI, France 
Maria Tenje – DTU Nanotech-Technical University of Denmark, Denmark 
Harrie Tilmans – IMEC, Belgium 
Jean–Herve Tortai – LTM/CNRS, France 
Christos Tsamis – NCSR Demokritos, Greece 
Angeliki Tserepi – NCSR Demokritos, Greece 
Dimitris Tsoukalas – National Techn. Univ. of Athens, Greece 
Marlies K. Van Bael – IMO-IMOMEC, Belgium
Falco C.M. Van Delft – Philips Research Laboratories, The Netherlands 
Emile Van der Drift – Delft University of Technology, The Netherlands 
Pol Van Dorpe – IMEC, Belgium
Jeroen Van Kan – CIBA-NUS, Singapore
Dries Van Thourhout – IMEC/INTEC, Belgium
Geert Vandenberghe – IMEC, Belgium
Philippe Vereecken – IMEC, Belgium
Christophe Vieu – University of Toulouse, France
Guillermo Villanueva – EPFL, Switzerland
Francoise Vinet – CEA-LETI, France
Katia Vutova – Bulgarian Academy of Sciences, Bulgaria 
Lon Wang – Dept. Elec. Eng. Nat. Taiwan Univ., Taiwan
James Watkins – University of Massachusetts, USA
Ann Witvrouw – IMEC, Belgium
Jayne Wu – University of Tennessee, USA
Stefan Wurm – Advanced Micro Devices / SEMATECH, USA 
Ioanna Zergioti – NTUA, Greece