The programme frame can be downloaded here.
The detailed programme (update of 4 Sep) can be downloaded here.
For the list of posters (update of 4 Sep) , please click here.

The programme features plenary and invited presentations by a number of internationally recognised authors, contributed oral and poster presentations, and a commercial exhibition. The oral presentations and posters have been selected by the International Programme Committee which also selects the plenary and invited talks. Note that MNE poster papers have equal weight to oral presentations. During the conference, a poster award will be conferred to the best poster in each of the 4 main topics. The poster awards are sponsored by Raith and include a prize of 800 EUR.

Short courses will be organised on Monday 28 September (see section Short courses for further details).

Please note that the EC workshop on Micro-and Nanotechnology European funded projects (FP6/FP7) of Friday 2 October has been cancelled.

The list of confirmed keynote and invited speakers is included below.

Keynote speakers

• Luc Van den hove, IMEC (BE)
  Nanoelectronics in the future : tackling societal and environment challenges
  
  
• Hans C. Pfeiffer, HCP Consulting (US)
  New opportunities for electron-beam lithography: the promises and challenges of massively parallel pixel projection
  
  
• Lars Samuelson, Lund University (SE)
  Nanowires as a bottom-up approach for electronic and photonic devices
  
  
• Tobias Kippenberg, EPFL (CH)
  Cavity optomechanics - backaction cooling of mechanical motion
  
  
• Chad Mirkin, Northwestern University (US)
  Unconventional approaches to nanofabrication
  
  
• Franz Laermer, Bosch (DE)
  New directions and application areas for MEMS

Invited speakers

• Mircea Dusa, ASML (BE)
  Combinatorial lithography throughout 193i to EUV transistion to meet scaling requirements below 32nm
  
  
• Wolfgang Eberle, IMEC (BE)
  The bio-electronic interface in brain implants - from materials to electronics and back
  
  
• Filip Frederix, NXP (BE)
  A novel advanced CMOS biosensor technology for measuring affinity reactions
  
  
• John Heck, Intel (US)
  Ultra-high data density MEMS memory device
  
  
• Christofer Hierold, ETH Zurich (CH)
  Single walled carbon nanotube transistors as functional building blocks for sensors
  
  
• Tatsuhiko Higashiki, Toshiba (J)
  Challenges to next-generation lithography
  
  
• Mark Mann, Cambridge University (UK)
  Controlling the growth of carbon nanotubes for electronic devices
  
  
• Laurent Pain, Leti (FR)
  The position of direct write lithography in industry : a challenger or a complementary solution to EUV?
  
  
• Oliver Paul, Imtek (DE)
  Wafer-scale high-throughput mechanical characterization of MEMS structural layers
  
  
• Gregory Timp, University of Illinois (US)
  A tiny revolution: nanometer-scale tools for synthetic biology
  
  
• Ying Zhang, IBM (US)
  Plasma etching of nanometer scale features